Wafer Processing System

4″  (100mm)  Wafer Fab System 1 micron  processes Can be included: Diffusion furnace, 3 tube (custom gas cabinet [quoted separately) PVD Electron beam evaporator with 4 pocket gun Table top RIE (Reactive Ion Etcher) Programmable photo resist spinner 4″ mask aligner, 1 micron resolution   [shown in foto] 400x microscope with dark field One (1) 4 foot polypropylene wet station with hotplate One (1) 6 foot polypropylene wet station with hotplate Profilometer Plasma asher High resolution probe station with 2 probes Spin rinser dryer Wire bonder Die bonder Die shear/pull tester High temperature vacuum oven (400c for wafers) Vapor prime oven … Continue reading Wafer Processing System