REBFURBISHED!    The innovative Mark 40 represents a distinct breakthrough in vacuum deposition systems offering efficiency, flexibility and ease of maintenance. The Mark 40 accommodates a wide variety of deposition equipment, including versatile combinations of deposition sources and substrates fixturing to address virtually any application. SECS/GEM and CE compliant. Dual Operation, Sputtering and Evaporation Moving substrates Exceptional Film Uniformity (Fixture Dependent) Sputter Up Process Stations Round Cathodes, RF or DC (Up to 4 Stations) Co-deposit Bias, RF or DC Substrate heating, 400°C, multi-element Substrate heating, station Electron beam Thermal Ion beam pre-clean/etch Plasma texturing/etch Power Supply Options Electron beam, 6-10-15 … Continue reading CHA INDUSTRIES MARK 40 DEPOSITION SYSTEM