SierraTherm APCVD Lab System SiO2
[Atmospheric Pressure Chemical Vapor Deposition]
APCVD is a thin film deposition process
with typically high deposition rates.
A thin film is a layer of material ranging from fractions of a
nanometer (monolayer) to several ….
Techniques used for epitaxial growth of thin films include molecular beam epitaxy,
chemical vapor deposition, and pulsed laser deposition.
SIERRATHERM APCVD LAB SYSTEM