M4L Bench Top Surface Modification System

The M4L is our most popular full featured plasma surface modification system designed for laboratory and production use.

 
 The M4L is ideal for:

  • Plasma surface modification
  • Plasma cleaning of organic surfaces

     

    M4L Plasma System

     

     
     
     
     
    Easy Loading Trays

     

    Easily Accessible


     

     

 

 

  • Plasma cleaning of metallic surfaces
  • Bond strength enhancement
  • Plasma etch applications
  • Plasma asher applications
  • Increased or decreased wettability
  • Any other plasma system application

 

The entire bench top system fits in one cabinet 
except for the vacuum pump. 

Never before has a professional plasma etch system been this affordable!

Technical Details
 

Controller: Windows 2000 based touch screen interface 
offering fully automatic control. Multi-step recipes, real time graphic
 display, multi-level password access, data logging, 
and real time SPC monitoring of all plasma parameters is provided.

Chamber: 9" X 13" X 20" Aluminum
 with high-conductance KF 40 port and isolation valve. 

Electrode Options Include:  3 shelf, 5 shelf, and cage electrodes.

RF Generator: Built in 600 watt 13.56 MHz 
with automatic impedance matching network

Display: Graphic color 10.4 inch touch screen for control and monitoring of process parameters, automatic recipes, or manual plasma treatments

One user specified gas, with 500 sccm MFCs standard, 
Optional 2nd and 3rd gas available

Power Requirements: 120- 240 volts, 1ø, 50/60 Hz 30 amps maximum, changeable in the field